<< previous  next >>   WELL2825 :  Metrology - PIKE MappIR with N2 Purging Chamber To minimize interferences of water vapor and carbon dioxide with infrared measurements, the optical path of the accessories is equipped with purging lines and can be purged with dry air or nitrogen(N2). A Wafer Purge Enclosure(N2 Purging Chamber) is also available as an option.  Sale Price: RQ  Copyright (C) 2002-2023, WELLTECH All rights reserved.